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High-Power Laser Line Mirror

Chongfan Technology’s high‑power laser line mirrors are fabricated from high‑purity ultraviolet fused silica and coated with an ultra‑high laser‑induced damage threshold (LIDT) dielectric layer, enabling them to withstand high‑energy pulses while maintaining a superior damage threshold.

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  • Made from high-purity ultraviolet-fused quartz
  • Ultra-high laser-induced damage threshold dielectric film
  • High reflectance

Chongfan Technology’s high‑power laser line mirrors are fabricated from high‑purity UV fused silica and coated with an ultra‑high laser‑induced damage threshold (LIDT) dielectric layer, enabling them to withstand high‑energy pulses while maintaining a robust damage threshold. These mirrors are highly efficient reflectors optimized for a single wavelength range. The UV fused silica substrate exhibits superior homogeneity and a lower coefficient of thermal expansion, ensuring stable performance under temperature fluctuations and enhanced resistance to environmental influences. Chongfan Technology offers high‑power laser line mirrors in seven wavelength options—266 nm, 355 nm, 532 nm, 780 nm, 1064 nm, 1550 nm, and a dual‑wavelength configuration at 532 nm and 1064 nm—with an incident angle ranging from 0° to 45° and a reflectance exceeding 99%.

High-Power Laser Line Mirror

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