Chongfan Technology
News
29
2026
-
09
The Shanghai Institute of Optics and Fine Mechanics has made progress in the research on large-area, wide-angle, broadband antireflection metasurfaces.
Author:
Recently, the team from the High-Power Laser Components Technology and Engineering Department at the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, has made new progress in the research on large-area, wide-angle, broadband antireflection metasurfaces. The researchers employed nanoimprint lithography to fabricate large‑area, double‑sided fused‑silica nanopillar metasurfaces, achieving broadband, wide‑angle antireflection across the visible to near‑infrared spectral range, while demonstrating excellent high‑temperature stability and robust resistance to laser damage. The findings were published in Applied Physics Letters under the title “Large-area nanoimprinted metasurfaces for wide-angle broadband antireflection with refractory and laser durability.”
High‑power laser optical components must simultaneously exhibit low reflectivity, high thermal stability, and a high laser‑induced damage threshold. While conventional multilayer antireflection coatings offer excellent spectral performance, their layered interfaces are prone to thermal stress, cracking, or delamination under high temperatures and intense laser irradiation, and their antireflection characteristics are sensitive to both the angle of incidence and polarization. Biomimetic subwavelength “moth‑eye” structures reduce Fresnel reflections through graded refractive indices, providing broad bandwidth and wide‑angle advantages; however, achieving large‑area, high‑fidelity double‑sided fabrication on fused silica—while maintaining thermal stability and laser resistance—remains a significant challenge.
To address the aforementioned issues, the research team combined nanoimprint lithography with inductively coupled plasma etching to fabricate, on both sides of a 2 × 2 cm² fused‑silica substrate, an array of conical nanopillars approximately 190 nm tall. This single‑material gradient‑index structure reduces the average reflectance of quartz from 5.6% to below 2.4% across the 400–1500 nm wavelength range and exhibits wide‑angle, low polarization‑dependence antireflection performance. Moreover, the nanostructure enhances surface wettability. After high‑temperature annealing at 1100 °C, the structural morphology and spectral properties remain essentially stable; under 1064 nm nanosecond laser irradiation, the estimated laser damage threshold reaches 23.5 J/cm². This work demonstrates a double‑sided fused‑silica metasurface that simultaneously achieves broadband, wide‑angle antireflection, thermal stability, and high laser resistance, offering a novel fabrication approach for high‑power laser optical components.
This research was supported by projects including the National Natural Science Foundation of China, the Shanghai Municipal Natural Science Foundation, and the China Association for Science and Technology’s Young Talent Support Program.
Figure 1. Optical performance and structural characterization of a large-area, double-sided fused‑silica nanopillar metasurface. (a) Experimentally measured and (b) simulated reflectance spectra for both unpatterned and patterned samples; (c)–(d) results from nanoindentation tests; (e) photograph of a 2 × 2 cm² sample and SEM image of the nanopillar structure; (f) water contact angles of the unpatterned and patterned samples.
Figure 2. High-temperature stability and laser‑induced damage characteristics of large‑area fused quartz nanopillar metasurfaces. (a) Rapid thermal annealing setup; (b) Reflectance spectra before and after annealing at 1100 °C; (c) SEM images before and after annealing; (d) Setup for 1064 nm nanosecond laser‑induced damage testing; (e)–(f) Typical laser‑induced damage morphologies of unpatterned and patterned samples.
Source: Shanghai Institute of Optics and Fine Mechanics
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